May 05, 2024  
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ARCHIVED 2014-2015 Undergraduate Catalog [ARCHIVED CATALOG]

CMC 430 - Microscopic Particle Handling: Particle Isolation, Manipulation and Mounting

3.00 credit hours
This course focuses on isolating, mounting and handling 1-100μm sized particles without the use of micromanipulators. Methods for isolating contaminants from liquids, solids or on surfaces are covered. Preparation methods for further analysis by PLM, IR, Raman, SEM and TEM are demonstrated and discussed. Each student is supplied with a detailed laboratory manual for reference and works hands-on with an Olympus SZX10 stereomicroscope for use during class exercises. Olympus BX51 polarized light microscopes are also available for student use during class exercises. Includes practicum.

Prerequisite(s): Admission into the CMC program.


Click here for the schedule of classes.